<oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/"><dc:title xml:lang="en">Modeling of evaporation of macroparticles of vacuum arcs by an electron beam</dc:title><dc:creator>Litovko, Iryna</dc:creator><dc:creator>Rudolph, Martin</dc:creator><dc:creator>Anders, André</dc:creator><dc:creator>Goncharov, Alexey</dc:creator><dc:contributor>Iryna Litovko</dc:contributor><dc:source>ISSN: 3076-1468</dc:source><dc:source>Open Plasma Science</dc:source><dc:source>Episciences.org</dc:source><dc:identifier>http://ops.episciences.org/17481</dc:identifier><dc:identifier>info:doi:10.46298/ops.16405</dc:identifier><dc:source>ops:16405 - Open Plasma Science, 2026-02-11, ICPIG 2025</dc:source><dc:language>en</dc:language><dc:subject>plasma optics</dc:subject><dc:subject>vacuum-arc discharge</dc:subject><dc:subject>droplets</dc:subject><dc:subject>fast electrons</dc:subject><dc:subject>film deposition</dc:subject><dc:subject>droplet evaporation</dc:subject><dc:rights>info:eu-repo/semantics/openAccess</dc:rights><dc:rights>info:eu-repo/semantics/openAccess</dc:rights><dc:type>info:eu-repo/semantics/article</dc:type><dc:type>Journal articles</dc:type><dc:type>info:eu-repo/semantics/publishedVersion</dc:type><dc:audience>Researchers</dc:audience><dc:description xml:lang="en">The evaporation of droplets in an arc plasma flow under the action of an electron beam injected into the arc plasma and the condition of direct heating of microdroplets by beam electrons are considered. Analytical modeling shows that droplets ≤1 μm in size can be completely evaporated over time scales typical for cathodic arc deposition systems. It is shown that small microdroplets evaporate more intensively. The lower limit working points in terms of plasma electron density, and the electron energy and density of the injected energetic electrons required for droplet evaporation are found.   </dc:description><publisher>Université de Lorraine</publisher><dc:date>2026-02-11</dc:date></oai_dc:dc>