engUniversité de LorraineOpen Plasma Science3076-14682026-02-11ICPIG 202510.46298/ops.1640516405journal articleIryna Litovko12https://orcid.org/0000-0003-3668-0215Martin Rudolph1https://orcid.org/0000-0002-0854-6708André Anders01https://orcid.org/0000-0002-5313-6505Alexey Goncharov3https://orcid.org/0000-0002-3890-8458Felix Bloch Institute of Solid State PhysicsLeibniz Institute of Surface EngineeringInstitute for Nuclear ResearchInstitute of Physics NAS of UkraineThe evaporation of droplets in an arc plasma flow under the action of an electron beam injected into the arc plasma and the condition of direct heating of microdroplets by beam electrons are considered. Analytical modeling shows that droplets ≤1 μm in size can be completely evaporated over time scales typical for cathodic arc deposition systems. It is shown that small microdroplets evaporate more intensively. The lower limit working points in terms of plasma electron density, and the electron energy and density of the injected energetic electrons required for droplet evaporation are found.   http://ops.episciences.org/16405/pdfplasma opticsvacuum-arc dischargedropletsfast electronsfilm depositiondroplet evaporation