episciences.org_16754_2026051822204418520260518222044185episciences.orgraphael.tournoy+crossrefapi@ccsd.cnrs.frepisciences.orgOpen Plasma Science3076-146810.46298/journals/opshttp://ops.episciences.org01262026Volume 2MorenoJoelDepartment of Physics and Engineering Physics [Saskatoon]JimenezMarilynDepartment of Physics and Engineering Physics [Saskatoon]OkerstromDanielDepartment of Physics and Engineering Physics [Saskatoon]BradleyMichael P.Department of Physics and Engineering Physics [Saskatoon]CouëdelLénaïcPhysique des interactions ioniques et moléculairesDepartment of Physics and Engineering Physics [Saskatoon]https://orcid.org/0000-0003-0749-9273In this article, we present a detailed characterisation of a multicusp-assisted inductively coupled RF plasma source for plasma immersion ion implantation (PIII). Using laser-induced fluorescence (LIF) and RF-compensated Langmuir probe diagnostics, we measured ion temperature T i and drift velocity v z in argon plasmas near an immersed electrode. The multicusp configuration enhances plasma density at low pressure, enabling stable operation down to 0.8 mTorr. Timeaveraged measurements show no detectable perturbation near the pulsed electrode, indicating full plasma recovery between high-voltage pulses. LIF-derived potential profiles match Riemann's presheath theory, and ion velocity distributions reveal acceleration consistent with sheath dynamics. These results support the use of LIF for steady-state characterisation of the bulk and presheath regions in PIII systems.012620260114202616754https://creativecommons.org/licenses/by/4.0https://creativecommons.org/licenses/by/4.0https://creativecommons.org/licenses/by/4.0https://hal.science/hal-05322136v4https://hal.science/hal-05322136v3https://hal.science/hal-05322136v2https://hal.science/hal-05322136v110.46298/ops.16754http://ops.episciences.org/16754https://hal.science/hal-05322136v4/documenthttps://hal.science/hal-05322136v4/document